Computational Study of the Gas Phase Reactions of Isopropylimido and Allylimido Tungsten Precursors for Chemical Vapor Deposition of Tungsten Carbonitride Films: Implications for the Choice of Carrier Gas
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چکیده
Chemistry of Materials is published by the American Chemical Society. 1155 Sixteenth Street N.W., Washington, DC 20036 Article Computational Study of the Gas Phase Reactions of Isopropylimido and Allylimido Tungsten Precursors for Chemical Vapor Deposition of Tungsten Carbonitride Films: Implications for the Choice of Carrier Gas Yong Sun Won, Young Seok Kim, Timothy J. Anderson, and Lisa McElwee-White Chem. Mater., 2008, 20 (23), 7246-7251 • Publication Date (Web): 14 November 2008 Downloaded from http://pubs.acs.org on December 3, 2008
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